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dc.contributor.authorChen, Ching-Weien_US
dc.contributor.authorLin, Yen-Chengen_US
dc.contributor.authorChang, Chia-Huaen_US
dc.contributor.authorYu, Peichenen_US
dc.contributor.authorShieh, Jia-Minen_US
dc.contributor.authorPan, Ci-Lingen_US
dc.date.accessioned2014-12-08T15:47:37Z-
dc.date.available2014-12-08T15:47:37Z-
dc.date.issued2010-12-01en_US
dc.identifier.issn0018-9197en_US
dc.identifier.urihttp://dx.doi.org/10.1109/JQE.2010.2063696en_US
dc.identifier.urihttp://hdl.handle.net/11536/31867-
dc.description.abstractTransparent and conducting indium tin oxide (ITO) thin films form an integral part for various optoelectronic devices. In this paper, we report the frequency-dependent complex conductivities and dielectric responses of several sputtered ITO thin films with thicknesses in the range of 189-962 nm by using terahertz time domain spectroscopy (THz-TDS), optical reflectance spectroscopy, and electrical measurements. The plasma frequencies are verified to be from 1590 to 1930 rad.THz, while the scattering times are in the range 6-7 fs based on the Drude free-electron model. The mobilities of the above ITO thin films are calculated to be 32.7-34.2 cm(2) V(-1) s(-1), whereas the carrier concentrations lie in the range 2.79-4.10 x 10(20) cm(-3). The electrical properties derived from the THz-TDS technique agree well with those determined by Hall measurement. Parameters for the complex dielectric function suitable for ITO in the range 0.2-2 and 4-450 THz are also determined.en_US
dc.language.isoen_USen_US
dc.subjectDielectric functionen_US
dc.subjectdrude free-electron modelen_US
dc.subjectindium tin oxideen_US
dc.subjectoptical constantsen_US
dc.subjectplasma frequencyen_US
dc.subjectscattering timeen_US
dc.subjectterahertz time domain spectroscopyen_US
dc.titleFrequency-Dependent Complex Conductivities and Dielectric Responses of Indium Tin Oxide Thin Films from the Visible to the Far-Infrareden_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JQE.2010.2063696en_US
dc.identifier.journalIEEE JOURNAL OF QUANTUM ELECTRONICSen_US
dc.citation.volume46en_US
dc.citation.issue12en_US
dc.citation.spage1746en_US
dc.citation.epage1754en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000284358400007-
dc.citation.woscount17-
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