完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chen, Ching-Wei | en_US |
dc.contributor.author | Lin, Yen-Cheng | en_US |
dc.contributor.author | Chang, Chia-Hua | en_US |
dc.contributor.author | Yu, Peichen | en_US |
dc.contributor.author | Shieh, Jia-Min | en_US |
dc.contributor.author | Pan, Ci-Ling | en_US |
dc.date.accessioned | 2014-12-08T15:47:37Z | - |
dc.date.available | 2014-12-08T15:47:37Z | - |
dc.date.issued | 2010-12-01 | en_US |
dc.identifier.issn | 0018-9197 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/JQE.2010.2063696 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/31867 | - |
dc.description.abstract | Transparent and conducting indium tin oxide (ITO) thin films form an integral part for various optoelectronic devices. In this paper, we report the frequency-dependent complex conductivities and dielectric responses of several sputtered ITO thin films with thicknesses in the range of 189-962 nm by using terahertz time domain spectroscopy (THz-TDS), optical reflectance spectroscopy, and electrical measurements. The plasma frequencies are verified to be from 1590 to 1930 rad.THz, while the scattering times are in the range 6-7 fs based on the Drude free-electron model. The mobilities of the above ITO thin films are calculated to be 32.7-34.2 cm(2) V(-1) s(-1), whereas the carrier concentrations lie in the range 2.79-4.10 x 10(20) cm(-3). The electrical properties derived from the THz-TDS technique agree well with those determined by Hall measurement. Parameters for the complex dielectric function suitable for ITO in the range 0.2-2 and 4-450 THz are also determined. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Dielectric function | en_US |
dc.subject | drude free-electron model | en_US |
dc.subject | indium tin oxide | en_US |
dc.subject | optical constants | en_US |
dc.subject | plasma frequency | en_US |
dc.subject | scattering time | en_US |
dc.subject | terahertz time domain spectroscopy | en_US |
dc.title | Frequency-Dependent Complex Conductivities and Dielectric Responses of Indium Tin Oxide Thin Films from the Visible to the Far-Infrared | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/JQE.2010.2063696 | en_US |
dc.identifier.journal | IEEE JOURNAL OF QUANTUM ELECTRONICS | en_US |
dc.citation.volume | 46 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.spage | 1746 | en_US |
dc.citation.epage | 1754 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000284358400007 | - |
dc.citation.woscount | 17 | - |
顯示於類別: | 期刊論文 |