統計資料
總造訪次數
| 檢視 | |
|---|---|
| Effect of fluorinated silicate glass passivation layer on electrical characteristics and dielectric reliabilities for the HfO(2)/SiON gate stacked nMOSFET | 105 |
本月總瀏覽
| 六月 2025 | 七月 2025 | 八月 2025 | 九月 2025 | 十月 2025 | 十一月 2025 | 十二月 2025 | |
|---|---|---|---|---|---|---|---|
| Effect of fluorinated silicate glass passivation layer on electrical characteristics and dielectric reliabilities for the HfO(2)/SiON gate stacked nMOSFET | 0 | 0 | 0 | 0 | 0 | 1 | 0 |
檔案下載
| 檢視 |
|---|
國家瀏覽排行
| 檢視 | |
|---|---|
| China | 99 |
| United States | 5 |
縣市瀏覽排行
| 檢視 | |
|---|---|
| Shenzhen | 98 |
| Kensington | 3 |
| Menlo Park | 2 |
| Chengdu | 1 |