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dc.contributor.authorJiang, Meng-Danen_US
dc.contributor.authorWang, Ling-Yungen_US
dc.contributor.authorLin, Hong-Cheuen_US
dc.contributor.authorWei, Ta-Chinen_US
dc.contributor.authorYang, Shih-Hsienen_US
dc.contributor.authorChuang, Cheng-Hsiangen_US
dc.contributor.authorTseng, Tsung-Peien_US
dc.date.accessioned2014-12-08T15:47:59Z-
dc.date.available2014-12-08T15:47:59Z-
dc.date.issued2010-11-01en_US
dc.identifier.issn0253-3839en_US
dc.identifier.urihttp://dx.doi.org/10.1080/02533839.2010.9671696en_US
dc.identifier.urihttp://hdl.handle.net/11536/32026-
dc.description.abstractThis work describes amorphous fluorinated polymer films deposited by pulsed plasma polymerizations of octafluorotoluene (PPP-OFT) monomers on ITO glass as the hole-injection layer of organic electroluminescent (EL) devices, in order to study the influence of sample position and duty cycle on PPP-OFT film characteristics, and also to find a good process to yield a higher retention degree of monomers and lower roughness of PPP-OFT fluorocarbon films. Experimental results revealed that PPP-OFT films deposited at positions far away from the RF coil and close to the monomer inlet showed less roughness than films deposited near the high RF-flux regions. In addition, the retention of the monomers in the PPP-OFT layer will be high if the deposition is conducted near the monomer inlet but some distance away from the RF electrode. Moreover, amorphous fluorinated polymer films can be deposited with higher fluorine to carbon (F/C) ratios and CF(2) contents at proper substrate positions by means of different sticking coefficients of free radicals dissociated by octafluorotoluene monomers.en_US
dc.language.isoen_USen_US
dc.subjectELen_US
dc.subjectpulsed plasma polymerizationsen_US
dc.subjectoctafluorotolueneen_US
dc.subjecthole-injectionen_US
dc.titleTHE INFLUENCE OF PROCESS PARAMETERS ON THE STRUCTURE AND MORPHOLOGY OF PULSED PLASMA-POLYMERIZED OCTAFLUOROTOLUENE FILMSen_US
dc.typeArticleen_US
dc.identifier.doi10.1080/02533839.2010.9671696en_US
dc.identifier.journalJOURNAL OF THE CHINESE INSTITUTE OF ENGINEERSen_US
dc.citation.volume33en_US
dc.citation.issue7en_US
dc.citation.spage1075en_US
dc.citation.epage1081en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000285082300014-
dc.citation.woscount0-
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