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dc.contributor.authorWei, An-Chien_US
dc.contributor.authorSze, Jyh-Rouen_US
dc.contributor.authorChern, Jyh-Longen_US
dc.date.accessioned2014-12-08T15:48:04Z-
dc.date.available2014-12-08T15:48:04Z-
dc.date.issued2010-11-01en_US
dc.identifier.issn0947-8396en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s00339-010-5834-6en_US
dc.identifier.urihttp://hdl.handle.net/11536/32047-
dc.description.abstractThe proposed optical systems are designed for extending the depths of foci (DOF) of UV lasers, which can be exploited in the laser-ablation technologies, such as laser machining and lithography. The designed systems are commonly constructed by an optical module that has at least one aspherical surface. Two configurations of optical module, lens-only and lens-reflector, are presented with the designs of 2-lens and 1-lens-1-reflector demonstrated by commercially optical software. Compared with conventional DOF-enhanced systems, which required the chromatic aberration lenses and the light sources with multiple wavelengths, the proposed designs are adapted to the single-wavelength systems, leading to more economical and efficient systems.en_US
dc.language.isoen_USen_US
dc.titleDesigns for optimizing depth of focus and spot size for UV laser ablationen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s00339-010-5834-6en_US
dc.identifier.journalAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSINGen_US
dc.citation.volume101en_US
dc.citation.issue2en_US
dc.citation.spage411en_US
dc.citation.epage416en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
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