完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Yang, Po-Yu | en_US |
dc.contributor.author | Wang, Jyh-Liang | en_US |
dc.contributor.author | Tsai, Wei-Chih | en_US |
dc.contributor.author | Wang, Shui-Jinn | en_US |
dc.contributor.author | Lin, Jia-Chuan | en_US |
dc.contributor.author | Lee, I-Che | en_US |
dc.contributor.author | Chang, Chia-Tsung | en_US |
dc.contributor.author | Cheng, Huang-Chung | en_US |
dc.date.accessioned | 2014-12-08T15:48:10Z | - |
dc.date.available | 2014-12-08T15:48:10Z | - |
dc.date.issued | 2010-10-01 | en_US |
dc.identifier.issn | 0040-6090 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.tsf.2010.04.104 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/32119 | - |
dc.description.abstract | In this paper, a simple self-assembled lateral growth of ZnO nanowires (NWs) photodetector has been synthesized by a hydrothermal method at a temperature as low as 85 degrees C. The ZnO NWs exhibit single-crystalline wurtzite with elongated c-axis and can be selectively lateral self-assembled around the edges of ZnO seeding layer. The current of ZnO NWs is sensitive to the variation of ambient pressures, i.e. 4.47 mu A was decreased to 1.48 mu A with 5 V-bias as 1.1 x 10(-6) Torr changed to 760 Torr. accordingly. Moreover, the current voltage characteristics of ZnO NWs photodetectors can be evidently distinguished by UV illumination (i.e. lambda = 325 nm). The photocurrent of ZnO NWs with UV illumination is twice larger than dark current while the voltage biased at 5 V. Consequently, this faster photoresponse convinces that the hydrothermally grown lateral ZnO NWs devices have a fairly good for the fabrication of UV photodetectors. (C) 2010 Elsevier B.V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Nanowire | en_US |
dc.subject | Self-assembled lateral growth | en_US |
dc.subject | Hydrothermal method | en_US |
dc.subject | Low temperature | en_US |
dc.title | Photoresponse of hydrothermally grown lateral ZnO nanowires | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.tsf.2010.04.104 | en_US |
dc.identifier.journal | THIN SOLID FILMS | en_US |
dc.citation.volume | 518 | en_US |
dc.citation.issue | 24 | en_US |
dc.citation.spage | 7328 | en_US |
dc.citation.epage | 7332 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000282915100036 | - |
dc.citation.woscount | 19 | - |
顯示於類別: | 期刊論文 |