標題: Characteristics of highly orientated BiFeO(3) thin films on a LaNiO(3)-coated Si substrate by RF sputtering
作者: Liu, Yen-Ting
Chen, San-Yuan
Lee, Hsin-Yi
材料科學與工程學系
加速器光源科技與應用學位學程
Department of Materials Science and Engineering
Master and Ph.D. Program for Science and Technology of Accelrrator Light Source
公開日期: 1-Oct-2010
摘要: BiFeO(3) (BFO) films were grown on LaNiO(3)-coated Si substrate by a RF magnetron sputtering system at temperatures in the range of 300-700 degrees C. X-ray reflectivity and high-resolution diffraction measurements were employed to characterize the microstructure of these films. For a substrate temperature below 300 degrees C and at 700 degrees C only partially crystalline films and completely randomly polycrystalline films were grown, whereas highly (001)-orientated BFO film was obtained for a substrate temperature in the range of 400-600 degrees C. The crystalline quality of BFO thin films increase as the deposition temperature increase except for the film deposited at 700 degrees C. The fitted result from X-ray reflectivity curves show that the densities of the BFO films are slightly less than their bulk values. For the BFO films deposited at 300-600 degrees C, the higher the deposition temperature, the larger the remnant polarization and surface roughness of the films present. (C) 2010 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2010.05.003
http://hdl.handle.net/11536/32124
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2010.05.003
期刊: THIN SOLID FILMS
Volume: 518
Issue: 24
起始頁: 7412
結束頁: 7415
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