完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chiang, M-H | en_US |
dc.contributor.author | Liao, K-C | en_US |
dc.contributor.author | Lin, I-M | en_US |
dc.contributor.author | Lu, C-C | en_US |
dc.contributor.author | Huang, H-Y | en_US |
dc.contributor.author | Kuo, C-L | en_US |
dc.contributor.author | Wu, J-S | en_US |
dc.contributor.author | Hsu, C-C | en_US |
dc.contributor.author | Chen, S-H | en_US |
dc.date.accessioned | 2014-12-08T15:48:13Z | - |
dc.date.available | 2014-12-08T15:48:13Z | - |
dc.date.issued | 2010-10-01 | en_US |
dc.identifier.issn | 0272-4324 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1007/s11090-010-9237-4 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/32139 | - |
dc.description.abstract | Effects of oxygen addition and treating distance on cleaning organic contaminants on stationary and non-stationary (1-9 cm/s) ITO glass surfaces by a parallel-plate nitrogen-based dielectric barrier discharge (DBD) are investigated experimentally; the DBD is driven by a 60 kHz bipolar quasi-pulsed power source. The results show that two regimes of favorable operating condition for improving the hydrophilic property of the surface (reducing the contact angle from 84 degrees to 25-30 degrees) are found. The measured spatial distribution of NO-gamma UV emission, O(3) concentration and OES spectra are shown to strongly correlate with the measured hydrophilic property. At the near jet downstream locations (z < 10 mm), the metastable N(2)(A(3)Sigma(+)(mu)) and photo-induced dissociation of ozone play dominant roles in cleaning the ITO glass surface; while at the far jet downstream locations (z > 10 mm), where the ratio of oxygen to nitrogen is lower, only the long-lived metastable N(2)(A(3)Sigma(+)(mu) ) plays a major role in cleaning the ITO glass surface. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Atmospheric-pressure plasma jet | en_US |
dc.subject | DBD | en_US |
dc.subject | ITO | en_US |
dc.subject | Quasi-pulsed | en_US |
dc.subject | Surface cleaning | en_US |
dc.title | Effects of Oxygen Addition and Treating Distance on Surface Cleaning of ITO Glass by a Non-Equilibrium Nitrogen Atmospheric-Pressure Plasma Jet | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1007/s11090-010-9237-4 | en_US |
dc.identifier.journal | PLASMA CHEMISTRY AND PLASMA PROCESSING | en_US |
dc.citation.volume | 30 | en_US |
dc.citation.issue | 5 | en_US |
dc.citation.spage | 553 | en_US |
dc.citation.epage | 563 | en_US |
dc.contributor.department | 機械工程學系 | zh_TW |
dc.contributor.department | Department of Mechanical Engineering | en_US |
顯示於類別: | 期刊論文 |