完整後設資料紀錄
DC 欄位 | 值 | 語言 |
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dc.contributor.author | Chen, J. F. | en_US |
dc.contributor.author | Chen, Ross C. C. | en_US |
dc.contributor.author | Chiang, C. H. | en_US |
dc.contributor.author | Hsieh, M. C. | en_US |
dc.contributor.author | Chang, Y. C. | en_US |
dc.contributor.author | Chen, Y. F. | en_US |
dc.date.accessioned | 2014-12-08T15:48:17Z | - |
dc.date.available | 2014-12-08T15:48:17Z | - |
dc.date.issued | 2010-09-15 | en_US |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.3467938 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/32189 | - |
dc.description.abstract | The use of a differential capacitance technique for analyzing the effect of strain relaxation on the electronic energy band structure in relaxed InAs self-assembled quantum dots (QDs) is presented. Strain relaxation is shown to induce a deep defect state and compensate the ionized impurity in the bottom GaAs layer, leading to a double depletion width and a long emission time. An expression of capacitance at different frequency and voltage is derived for analyzing the experimental data. It has been shown that the relationship between the low-frequency and high-frequency capacitances can be well explained by a Schottky depletion model with a compensated concentration in the bottom GaAs layer. A simple expression is presented to account for the modulation of the free electrons in the top GaAs layer. This capacitance analysis shows a long low-energy tail for the electron ground state, suggesting not very uniform strain relaxation. The results of this study illustrate a carrier compensation effect of the defect state on the electronic energy band structure near the QDs. (C) 2010 American Institute of Physics. [doi:10.1063/1.3467938] | en_US |
dc.language.iso | en_US | en_US |
dc.title | Compensation effect and differential capacitance analysis of electronic energy band structure in relaxed InAs quantum dots | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.3467938 | en_US |
dc.identifier.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 108 | en_US |
dc.citation.issue | 6 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:000282646400064 | - |
dc.citation.woscount | 0 | - |
顯示於類別: | 期刊論文 |