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dc.contributor.authorCHIOU, BSen_US
dc.contributor.authorCHUNG, MCen_US
dc.date.accessioned2014-12-08T15:04:43Z-
dc.date.available2014-12-08T15:04:43Z-
dc.date.issued1992-12-01en_US
dc.identifier.issn0002-7820en_US
dc.identifier.urihttp://dx.doi.org/10.1111/j.1151-2916.1992.tb04435.xen_US
dc.identifier.urihttp://hdl.handle.net/11536/3221-
dc.description.abstractNonohmic behavior is obtained for polycrystalline ZnO with copper as the only additive in the range 0.3 less-than-or-equal-to x less-than-or-equal-to 1 wt%. The effect of copper on the microstructure and electrical behavior of ZnO:Cu ceramics is investigated. The leakage current decreases and the breakdown electric field increases as the copper concentration increases. The large apparent dielectric constant of ZnO:Cu ceramic (k > > k(ZnO), k(ZnO) is the dielectric constant of pure ZnO) is attributed to the grain boundary barrier layer effect. A Schottky barrier height of 0.27-0.46 eV is obtained for various copper-added samples, depending on sintering temperatures.en_US
dc.language.isoen_USen_US
dc.titleEFFECT OF COPPER ADDITIVE ON THE MICROSTRUCTURE AND ELECTRICAL-PROPERTIES OF POLYCRYSTALLINE ZINC-OXIDEen_US
dc.typeArticleen_US
dc.identifier.doi10.1111/j.1151-2916.1992.tb04435.xen_US
dc.identifier.journalJOURNAL OF THE AMERICAN CERAMIC SOCIETYen_US
dc.citation.volume75en_US
dc.citation.issue12en_US
dc.citation.spage3363en_US
dc.citation.epage3368en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1992KC29100025-
dc.citation.woscount9-
Appears in Collections:Articles