完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | CHIOU, BS | en_US |
dc.contributor.author | CHUNG, MC | en_US |
dc.date.accessioned | 2014-12-08T15:04:43Z | - |
dc.date.available | 2014-12-08T15:04:43Z | - |
dc.date.issued | 1992-12-01 | en_US |
dc.identifier.issn | 0002-7820 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1111/j.1151-2916.1992.tb04435.x | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/3221 | - |
dc.description.abstract | Nonohmic behavior is obtained for polycrystalline ZnO with copper as the only additive in the range 0.3 less-than-or-equal-to x less-than-or-equal-to 1 wt%. The effect of copper on the microstructure and electrical behavior of ZnO:Cu ceramics is investigated. The leakage current decreases and the breakdown electric field increases as the copper concentration increases. The large apparent dielectric constant of ZnO:Cu ceramic (k > > k(ZnO), k(ZnO) is the dielectric constant of pure ZnO) is attributed to the grain boundary barrier layer effect. A Schottky barrier height of 0.27-0.46 eV is obtained for various copper-added samples, depending on sintering temperatures. | en_US |
dc.language.iso | en_US | en_US |
dc.title | EFFECT OF COPPER ADDITIVE ON THE MICROSTRUCTURE AND ELECTRICAL-PROPERTIES OF POLYCRYSTALLINE ZINC-OXIDE | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1111/j.1151-2916.1992.tb04435.x | en_US |
dc.identifier.journal | JOURNAL OF THE AMERICAN CERAMIC SOCIETY | en_US |
dc.citation.volume | 75 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.spage | 3363 | en_US |
dc.citation.epage | 3368 | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:A1992KC29100025 | - |
dc.citation.woscount | 9 | - |
顯示於類別: | 期刊論文 |