標題: Growth and photoresponse study of PdO nanoflakes reactive-sputter deposited on SiO(2)
作者: Huang, Chien-Jung
Pan, Fu-Ming
Chen, Hsiu-Ying
Li-Chang
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 1-Sep-2010
摘要: This study prepares PdO nanostructures on a SiO(2) substrate by reactive-sputter deposition and examines photoresponse characteristics of the thin films. PdO thin films deposited at 25 degrees C is composed of bowed nanoflakes standing on the SiO(2) substrate, which have a single-crystalline structure after thermal anneal at 400 degrees C. The 400 degrees C-annealed nanoflake thin film has a band gap energy in the red-light range (similar to 2.06 eV), and exhibits a very sensitive photoresponse upon the UV (365 nm) illumination. The high photoresponse sensitivity of the 400 degrees C-annealed nanoflake thin film is ascribed to a lower density of recombination centers and traps due to an excellent crystallinity and a high carrier extraction efficiency due to a low electrical resistivity. A slight decrease in the photocurrent density during the initial stage of the UV illumination is attributed to adsorption of O(2)(-) anions on the 400 degrees C-annealed nanoflakes. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3476567]
URI: http://dx.doi.org/10.1063/1.3476567
http://hdl.handle.net/11536/32272
ISSN: 0021-8979
DOI: 10.1063/1.3476567
期刊: JOURNAL OF APPLIED PHYSICS
Volume: 108
Issue: 5
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