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dc.contributor.authorChen, J. F.en_US
dc.contributor.authorChen, Ross C. C.en_US
dc.contributor.authorChiang, C. H.en_US
dc.contributor.authorChen, Y. F.en_US
dc.contributor.authorWu, Y. H.en_US
dc.contributor.authorChang, L.en_US
dc.date.accessioned2014-12-08T15:48:27Z-
dc.date.available2014-12-08T15:48:27Z-
dc.date.issued2010-08-30en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3483757en_US
dc.identifier.urihttp://hdl.handle.net/11536/32277-
dc.description.abstractCapping InAs quantum dots (QDs) with an InGaAs layer allows strain relaxation to induce a low-energy electron state below a set of fine dot family states, which is consistent with photoluminescence (PL) spectra. The evolution of InAs thickness suggests a bimodal onset relaxation, i.e., a fine dot family that is strain-relieved by indium outdiffusion from the QDs, as suggested by transmission electron microscopy, and a low-energy dot family that is strain relaxed by the generation of lattice misfits. The indium outdiffusion can explain an abnormal PL blueshift in 70 meV in the fine dot family at onset of strain relaxation. (C) 2010 American Institute of Physics. [doi:10.1063/1.3483757]en_US
dc.language.isoen_USen_US
dc.titleBimodel onset strain relaxation in InAs quantum dots with an InGaAs capping layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3483757en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume97en_US
dc.citation.issue9en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000282187200029-
dc.citation.woscount5-
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