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dc.contributor.authorSun, Yu-Chenen_US
dc.contributor.authorYeh, Sheng-Shiuanen_US
dc.contributor.authorLin, Juhn-Jongen_US
dc.date.accessioned2019-04-03T06:38:26Z-
dc.date.available2019-04-03T06:38:26Z-
dc.date.issued2010-08-12en_US
dc.identifier.issn1098-0121en_US
dc.identifier.urihttp://dx.doi.org/10.1103/PhysRevB.82.054203en_US
dc.identifier.urihttp://hdl.handle.net/11536/32301-
dc.description.abstractWe have measured the tunneling differential conductances, G(V), of four Al/AlOx/Cr planar tunnel junctions as well as the conductivities, sigma(T), of the Cr electrodes at liquid-helium temperatures. The Cr electrodes were made to be granular with dimensionless intergrain tunneling conductance spanning from g similar or equal to 1 to g >> 1, and the dimensionality of the granular array d=3. For the samples with g >> 1, we found that the measured G(V) curves display large zero-bias singularities which obey a ln V law at low bias voltages (less than or similar to a few millielectron volt) while crossing over to a root V law at high bias voltages. Simultaneously, the conductivities of the Cr electrodes reveal ln T dependence below a characteristic temperature. These results are explained in terms of the recent theory of granular metals. In a sample with g similar or equal to 1, in addition to the conductivity dependence sigma proportional to ln T, we observed a universal scaling behavior of the normalized differential conductance [G(V, T) -G(0, T)]/root T with the combined parameter root e vertical bar V vertical bar/k(B)T in a wide temperature interval of 2.5-32 K. This result is not yet understood.en_US
dc.language.isoen_USen_US
dc.titleConductivity and tunneling density of states in granular Cr filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1103/PhysRevB.82.054203en_US
dc.identifier.journalPHYSICAL REVIEW Ben_US
dc.citation.volume82en_US
dc.citation.issue5en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000280849400002en_US
dc.citation.woscount13en_US
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