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dc.contributor.authorHuang, Hsin-Taoen_US
dc.contributor.authorTsai, Chuang-Chuangen_US
dc.contributor.authorHuang, Yi-Paien_US
dc.date.accessioned2014-12-08T15:48:39Z-
dc.date.available2014-12-08T15:48:39Z-
dc.date.issued2010-08-01en_US
dc.identifier.issn0146-9592en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OL.35.002547en_US
dc.identifier.urihttp://hdl.handle.net/11536/32362-
dc.description.abstractThe UV-excited flat lighting (UFL) technique differs from conventional fluorescent lamp or LED illumination. It involves using a remote phosphor film to convert the wavelength of UV light to visible light, achieving high brightness and planar and uniform illumination. In particular, UFL can accomplish compact size, low power consumption, and symmetrical dual-sided illumination. Additionally, UFL utilizes a thermal radiation mechanism to release the large amount of heat that is generated upon illumination without thermal accumulation. These characteristics of the UFL technique can motivate a wide range of lighting applications in thin-film transistor LCD backlighting or general lighting. (C) 2010 Optical Society of Americaen_US
dc.language.isoen_USen_US
dc.titleUltraviolet excitation of remote phosphor with symmetrical illumination used in dual-sided liquid-crystal displayen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OL.35.002547en_US
dc.identifier.journalOPTICS LETTERSen_US
dc.citation.volume35en_US
dc.citation.issue15en_US
dc.citation.spage2547en_US
dc.citation.epage2549en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000281056700016-
dc.citation.woscount1-
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