標題: Phonon-plasmon interaction in GaN films studied by Raman scattering
作者: Shen, CC
Shu, CK
Lin, HC
Chen, WK
Chen, WH
Lee, MC
電子物理學系
Department of Electrophysics
關鍵字: optical properties and materials;infrared and Raman spectra and scattering
公開日期: 1-二月-1998
摘要: GaN films of different buffer thicknesses (from 0 to 600 Angstrom) were grown on (0001) sapphire using MOCVD. The epitaxial films show autodoping with carrier concentration ranging from 8 x 10(16) to 5 x 10(17) cm(-3) as determined by Hall measurements. The Raman scattering reveals that the A(1)(LO) mode shifts from 733 to 740 cm(-1) as a result of the phonon-plasmon interaction.
URI: http://hdl.handle.net/11536/32828
ISSN: 0577-9073
期刊: CHINESE JOURNAL OF PHYSICS
Volume: 36
Issue: 1
起始頁: 27
結束頁: 31
顯示於類別:期刊論文