POLY(DIMETHYL-CO-DIPHENYLSILANE) AS A DEEP-UV AND AN OXYGEN PLASMA PORTABLE CONFORMABLE MASK

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	LOONG, WA	en_US
dc.contributor.author	WANG, TH	en_US
dc.date.accessioned	2014-12-08T15:04:50Z	-
dc.date.available	2014-12-08T15:04:50Z	-
dc.date.issued	1992-08-01	en_US
dc.identifier.issn	0167-9317	en_US
dc.identifier.uri	http://hdl.handle.net/11536/3347	-
dc.description.abstract	Bi-layer resist processes for deep-UV and oxygen plasma are studied. Poly(dimethyl-co-diphenylsilane) is used as both deep-UV and oxygen plasma portable conformable masks because of its strong deep-UV and i-line (365 nm) absorption and its resistance to oxygen plasma. The bottom layer is P(MMA-PhPK), a copolymer of methylmethacrylate and 30 wt% of phenylpropenylketone, for the positive-tone pattern. P(MMA-PhPK) has greater deep-UV exposure sensitivity compared to PMMA. Good vertical sidewall profiles of lines of bottom layers are obtained.	en_US
dc.language.iso	en_US	en_US
dc.subject	POLY(DIMETHYL-CO-DIPHENYLSILANE)	en_US
dc.subject	POLY(METHYLMETHACRYLATE-CO-PHENYLPROPENYLKETONE)	en_US
dc.subject	PORTABLE CONFORMABLE MASK	en_US
dc.subject	BILAYER RESIST	en_US
dc.title	POLY(DIMETHYL-CO-DIPHENYLSILANE) AS A DEEP-UV AND AN OXYGEN PLASMA PORTABLE CONFORMABLE MASK	en_US
dc.type	Article	en_US
dc.identifier.journal	MICROELECTRONIC ENGINEERING	en_US
dc.citation.volume	18	en_US
dc.citation.issue	3	en_US
dc.citation.spage	207	en_US
dc.citation.epage	214	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:A1992JQ84900001	-
dc.citation.woscount	1	-
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