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dc.contributor.authorYEH, CFen_US
dc.contributor.authorLIN, SSen_US
dc.contributor.authorYANG, GPen_US
dc.date.accessioned2014-12-08T15:05:01Z-
dc.date.available2014-12-08T15:05:01Z-
dc.date.issued1992-02-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.31.151en_US
dc.identifier.urihttp://hdl.handle.net/11536/3543-
dc.description.abstractThermal sensors utilizing p-n junction diodes built into the polycrystalline silicon layer are developed. The effective factors influencing the thermal coefficient of polycrystalline silicon thermal sensor diodes are clarified. It is found that diodes with a light boron dose have a larger thermal coefficient than those with a heavy boron dose. The plural p-n diodes connected with more cascade series number have a larger thermal coefficient than ones with less cascade series number. The periphery of the thermal sensor seems to have little effect on the thermal coefficient. In addition, the thermal coefficient will become higher as a larger forward current is selected. The thermal coefficient of the sensor with a boron dose of 1 x 10(15) cm-2 will reach a saturation value of -2 mV/K when the forward current is above 2-mu-A.en_US
dc.language.isoen_USen_US
dc.subjectPOLYCRYSTALLINE SIen_US
dc.subjectP-N JUNCTIONen_US
dc.subjectTHERMAL SENSORen_US
dc.subjectTHERMAL COEFFICIENTen_US
dc.subjectDOPINGen_US
dc.subjectTHERMAL SENSITIVITYen_US
dc.subjectCASCADE SERIES NUMBERen_US
dc.subjectPERIPHERYen_US
dc.titleINVESTIGATION OF THERMAL COEFFICIENT FOR POLYCRYSTALLINE SILICON THERMAL SENSOR DIODEen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.31.151en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume31en_US
dc.citation.issue2Aen_US
dc.citation.spage151en_US
dc.citation.epage155en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1992HK02800001-
dc.citation.woscount0-
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