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dc.contributor.authorWU, JSen_US
dc.contributor.authorCHANG, KHen_US
dc.contributor.authorLEE, CPen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.authorLIU, DGen_US
dc.contributor.authorLIOU, DCen_US
dc.date.accessioned2014-12-08T15:05:12Z-
dc.date.available2014-12-08T15:05:12Z-
dc.date.issued1991-07-01en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.105532en_US
dc.identifier.urihttp://hdl.handle.net/11536/3738-
dc.description.abstractThe photoluminescence (PL) of double-barrier resonant tunneling structures (DBRTSs) with undoped electrodes under bias has been studied. The strong band bending across the cathode causes the quantum size effect in the accumulation layer. The resonant tunneling of electrons from the first excited quantum level in the accumulation layer produces a kink in the current-voltage characteristic. It is found that the PL intensity from the quantum well (QW) as a function of bias sharply peaks at the voltage corresponding to the kink. This provides evidence of the interaction between the first excited quantum state in the accumulation layer and the resonant state in the QW.en_US
dc.language.isoen_USen_US
dc.titleQUANTUM EFFECT IN THE ACCUMULATION LAYER ON FIELD-INDUCED PHOTOLUMINESCENCE OF DOUBLE-BARRIER RESONANT TUNNELING STRUCTURESen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.105532en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume59en_US
dc.citation.issue1en_US
dc.citation.spage87en_US
dc.citation.epage89en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1991FU34400030-
dc.citation.woscount1-
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