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dc.contributor.authorDAI, CMen_US
dc.contributor.authorSU, CSen_US
dc.contributor.authorCHUU, DSen_US
dc.date.accessioned2014-12-08T15:05:17Z-
dc.date.available2014-12-08T15:05:17Z-
dc.date.issued1991-03-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.348473en_US
dc.identifier.urihttp://hdl.handle.net/11536/3833-
dc.description.abstractThin films were deposited on Pyrex glass substrates from Ti and TiO2 targets at room temperature by laser evaporation technique. These films were characterized by scanning electron microscopy, Auger electron spectroscopy, and depth profile analysis. The films deposited from Ti target are TiC(x) and TiO(y) matrix, while films from TiO2 target are almost stoichiometric in oxygen. The films have a smooth surface morphology under a laser power density of 5 X 10(6) W/cm2, which is close to the critical intensity for evaporation. The interface reaction of these films is strong, and the Ti atoms diffuse into the substrate.en_US
dc.language.isoen_USen_US
dc.titleCOMPOSITION AND CHEMICAL-REACTIONS OF TITANIUM-OXIDE FILMS DEPOSITED BY LASER EVAPORATIONen_US
dc.typeNoteen_US
dc.identifier.doi10.1063/1.348473en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume69en_US
dc.citation.issue6en_US
dc.citation.spage3766en_US
dc.citation.epage3768en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:A1991FD44000056-
dc.citation.woscount19-
Appears in Collections:Articles