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dc.contributor.authorLOONG, WAen_US
dc.contributor.authorPENG, NTen_US
dc.date.accessioned2014-12-08T15:05:18Z-
dc.date.available2014-12-08T15:05:18Z-
dc.date.issued1991-03-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/3853-
dc.description.abstractThe exposure characteristics of poly(methylisopropenylketone) (PMIPK) and poly(phenylisopropenylketone) (PPIPK) exposed to 40 and 80 keV H+ and B+ ion beams have been studied. It is found that the electron-rich phenyl group in PPIPK has increased stopping power for the bigger B+ ion, but not for the smaller H+ ion. For the same reason, the main chain scissioning of PPIPK is slower than that of PMIPK when they are exposed to B+, but not to H+, under the same exposure conditions. Linear relationships are found with simulation parameter A which stands for exposure efficiency of the ion beam as a function of exposure doses (keV x ion fluence) for a specific ion-exposed polymer within the used energy range.en_US
dc.language.isoen_USen_US
dc.subjectION BEAMen_US
dc.subjectPOLY(METHYLISOPROPENYLKETONE)en_US
dc.subjectPOLY(PHENYLISOPROPENYLKETONE)en_US
dc.subjectDEVELOPMENT DEPTHen_US
dc.titleKEV ION-BEAM-EXPOSED POLY(METHYLISOPROPENYLKETONE) AND POLY(PHENYLISOPROPENYLKETONE)en_US
dc.typeArticleen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume30en_US
dc.citation.issue3en_US
dc.citation.spage603en_US
dc.citation.epage607en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:A1991FD92100041-
dc.citation.woscount0-
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