完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | LOONG, WA | en_US |
dc.contributor.author | PENG, NT | en_US |
dc.date.accessioned | 2014-12-08T15:05:18Z | - |
dc.date.available | 2014-12-08T15:05:18Z | - |
dc.date.issued | 1991-03-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/3853 | - |
dc.description.abstract | The exposure characteristics of poly(methylisopropenylketone) (PMIPK) and poly(phenylisopropenylketone) (PPIPK) exposed to 40 and 80 keV H+ and B+ ion beams have been studied. It is found that the electron-rich phenyl group in PPIPK has increased stopping power for the bigger B+ ion, but not for the smaller H+ ion. For the same reason, the main chain scissioning of PPIPK is slower than that of PMIPK when they are exposed to B+, but not to H+, under the same exposure conditions. Linear relationships are found with simulation parameter A which stands for exposure efficiency of the ion beam as a function of exposure doses (keV x ion fluence) for a specific ion-exposed polymer within the used energy range. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | ION BEAM | en_US |
dc.subject | POLY(METHYLISOPROPENYLKETONE) | en_US |
dc.subject | POLY(PHENYLISOPROPENYLKETONE) | en_US |
dc.subject | DEVELOPMENT DEPTH | en_US |
dc.title | KEV ION-BEAM-EXPOSED POLY(METHYLISOPROPENYLKETONE) AND POLY(PHENYLISOPROPENYLKETONE) | en_US |
dc.type | Article | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | en_US |
dc.citation.volume | 30 | en_US |
dc.citation.issue | 3 | en_US |
dc.citation.spage | 603 | en_US |
dc.citation.epage | 607 | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | 應用化學系 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.contributor.department | Department of Applied Chemistry | en_US |
dc.identifier.wosnumber | WOS:A1991FD92100041 | - |
dc.citation.woscount | 0 | - |
顯示於類別: | 期刊論文 |