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dc.contributor.authorWU, JSen_US
dc.contributor.authorCHANG, KHen_US
dc.contributor.authorLEE, CPen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.authorLIU, DGen_US
dc.contributor.authorLIOU, DCen_US
dc.date.accessioned2014-12-08T15:05:19Z-
dc.date.available2014-12-08T15:05:19Z-
dc.date.issued1991-02-28en_US
dc.identifier.issn0013-5194en_US
dc.identifier.urihttp://hdl.handle.net/11536/3860-
dc.description.abstractIn doping and incorporation in the barrier layers of AlGaAs/GaAs double-barrier resonant tunnelling structures (DBRTSs) have been studied. It was found that the peak-to-valley current ratio (PVCR) can be improved by the proper amount of In doping. This is attributed to the improvement in the quality of the AlGaAs barrier layers due to the high surface migration rate of In atoms that reduces group III vacancies. Also pseudomorphic In(x)(Al0.5Ga0.5)(1-x)As/GaAs (x = 0.12) strained-layer DBRTSs have been fabricated by incorporating a sufficient amount of In into the AlGaAs barrier layers. PVCRs as high as 27.5 at 77 K have been obtained. This is the first realisation of such DBRTSs with lattice-mismatched quaternary barrier layers.en_US
dc.language.isoen_USen_US
dc.subjectSEMICONDUCTOR DEVICESen_US
dc.subjectTUNNELING STRUCTURESen_US
dc.titleINVESTIGATION OF INDIUM DOPING AND INCORPORATION IN ALGAAS/GAAS DOUBLE-BARRIER RESONANT TUNNELING STRUCTURESen_US
dc.typeArticleen_US
dc.identifier.journalELECTRONICS LETTERSen_US
dc.citation.volume27en_US
dc.citation.issue5en_US
dc.citation.spage428en_US
dc.citation.epage430en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1991FB12800021-
dc.citation.woscount2-
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