LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4

Full metadata record

DC Field	Value	Language
dc.contributor.author	CHIU, HT	en_US
dc.contributor.author	HUANG, CC	en_US
dc.date.accessioned	2014-12-08T15:05:31Z	-
dc.date.available	2014-12-08T15:05:31Z	-
dc.date.issued	1990-08-26	en_US
dc.identifier.issn	0065-7727	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4035	-
dc.language.iso	en_US	en_US
dc.title	LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4	en_US
dc.type	Meeting Abstract	en_US
dc.identifier.journal	ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY	en_US
dc.citation.volume	200	en_US
dc.citation.issue		en_US
dc.citation.spage	253	en_US
dc.citation.epage	INOR	en_US
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:A1990DU04202144	-
dc.citation.woscount	0	-
Appears in Collections:	Articles