Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | DUH, JG | en_US |
| dc.contributor.author | WU, YS | en_US |
| dc.contributor.author | CHOUI, BS | en_US |
| dc.date.accessioned | 2014-12-08T15:05:31Z | - |
| dc.date.available | 2014-12-08T15:05:31Z | - |
| dc.date.issued | 1990-08-01 | en_US |
| dc.identifier.issn | 0261-8028 | en_US |
| dc.identifier.uri | http://hdl.handle.net/11536/4043 | - |
| dc.language.iso | en_US | en_US |
| dc.title | RUTHERFORD BACKSCATTERING SPECTROSCOPY ANALYSIS OF AR+ IMPLANTED YTTRIA STABILIZED ZIRCONIA | en_US |
| dc.type | Article | en_US |
| dc.identifier.journal | JOURNAL OF MATERIALS SCIENCE LETTERS | en_US |
| dc.citation.volume | 9 | en_US |
| dc.citation.issue | 8 | en_US |
| dc.citation.spage | 916 | en_US |
| dc.citation.epage | 918 | en_US |
| dc.contributor.department | 電控工程研究所 | zh_TW |
| dc.contributor.department | Institute of Electrical and Control Engineering | en_US |
| dc.identifier.wosnumber | WOS:A1990DT98400016 | - |
| dc.citation.woscount | 1 | - |
| Appears in Collections: | Articles | |
- Microstructural evolution and formation mechanism of the interface between titanium and zirconia annealed at 1550 degrees C / Lin, KL;Lin, CC
- Zirconia-related phases in the zirconia/titanium diffusion couple after annealing at 1100 degrees-1550 degrees C / Lin, KL;Lin, CC
- Effect of zirconia content on electrical conductivities of mullite/zirconia composites measured by impedance spectroscopy / Ko, Hong-Da;Lin, Chien-Cheng;Chin, Kuo-Chuang
- Characterization of yttria-stabilized zirconia thin films grown by planar magnetron sputtering / Tsai, WC;Tseng, TY
Loading...