| 標題: | RUTHERFORD BACKSCATTERING SPECTROSCOPY ANALYSIS OF AR+ IMPLANTED YTTRIA STABILIZED ZIRCONIA |
| 作者: | DUH, JG WU, YS CHOUI, BS 電控工程研究所 Institute of Electrical and Control Engineering |
| 公開日期: | 1-Aug-1990 |
| URI: | http://hdl.handle.net/11536/4043 |
| ISSN: | 0261-8028 |
| 期刊: | JOURNAL OF MATERIALS SCIENCE LETTERS |
| Volume: | 9 |
| Issue: | 8 |
| 起始頁: | 916 |
| 結束頁: | 918 |
| Appears in Collections: | Articles |
- Microstructural evolution and formation mechanism of the interface between titanium and zirconia annealed at 1550 degrees C / Lin, KL;Lin, CC
- Zirconia-related phases in the zirconia/titanium diffusion couple after annealing at 1100 degrees-1550 degrees C / Lin, KL;Lin, CC
- Effect of zirconia content on electrical conductivities of mullite/zirconia composites measured by impedance spectroscopy / Ko, Hong-Da;Lin, Chien-Cheng;Chin, Kuo-Chuang
- Characterization of yttria-stabilized zirconia thin films grown by planar magnetron sputtering / Tsai, WC;Tseng, TY
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