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dc.contributor.authorWU, JSen_US
dc.contributor.authorLEE, CPen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.authorCHANG, KHen_US
dc.contributor.authorLIU, DGen_US
dc.contributor.authorLIOU, DCen_US
dc.date.accessioned2014-12-08T15:05:34Z-
dc.date.available2014-12-08T15:05:34Z-
dc.date.issued1990-05-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.344910en_US
dc.identifier.urihttp://hdl.handle.net/11536/4109-
dc.language.isoen_USen_US
dc.titleREPETITION OF NEGATIVE DIFFERENTIAL RESISTANCE IN VERTICALLY INTEGRATED DOUBLE-BARRIER RESONANT TUNNELING STRUCTURESen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.344910en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume67en_US
dc.citation.issue9en_US
dc.citation.spage4382en_US
dc.citation.epage4385en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1990DD73700077-
dc.citation.woscount2-
Appears in Collections:Articles


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