鍍膜氧壓對多鐵材料銩錳氧薄膜磁性的影響

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	吳宗叡	en_US
dc.contributor.author	Wu, Zong-Ray	en_US
dc.contributor.author	莊振益	en_US
dc.contributor.author	Juang, Jenh-Yih	en_US
dc.date.accessioned	2014-12-12T01:29:59Z	-
dc.date.available	2014-12-12T01:29:59Z	-
dc.date.issued	2008	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#GT079621530	en_US
dc.identifier.uri	http://hdl.handle.net/11536/42443	-
dc.description.abstract	本實驗使用脈衝雷射濺鍍系統在不同鍍膜氧壓下成長正交結構銩錳氧薄膜於LAO(110)基板上。我們使用超導量子干涉儀量測不同鍍膜氧壓下薄膜磁化率與溫度關係時觀察到其磁性有一些變化，並將量測結果與薄膜XRD圖譜(020)繞射峰半高寬比較，認為在本實驗的樣品中，氧壓在0.05 torr下所成長的薄膜其磁結構較其它樣品較佳。	zh_TW
dc.description.abstract	We have deposited a series of orthorhombic TmMnO3 thin films on LaAlO3(LAO)(110) substrates by pulsed laser deposition (PLD) under different oxygen pressures. These samples presumably will allow us to study how the magnetic properties of this multiferroic material vary with any structural variance induced by oxygen. In addition, it is also expected to give important implications in terms of considering device application. Our results show that the films deposited at PO2=0.05 torr appeared to display better crystalline quality and well-defined magnetic structure transition.	en_US
dc.language.iso	zh_TW	en_US
dc.subject	TmMnO	zh_TW
dc.subject	TmMnO3	zh_TW
dc.subject	銩錳氧	zh_TW
dc.subject	多鐵	zh_TW
dc.subject	薄膜	zh_TW
dc.subject	磁性	zh_TW
dc.subject	脈衝雷射鍍膜	zh_TW
dc.subject	TmMnO	en_US
dc.subject	TmMnO3	en_US
dc.subject	multiferroic	en_US
dc.subject	films	en_US
dc.subject	magnetism	en_US
dc.subject	PLD	en_US
dc.title	鍍膜氧壓對多鐵材料銩錳氧薄膜磁性的影響	zh_TW
dc.title	Effect of oxygen partial pressure on the magnetic properties of multiferroic TmMnO3 thin films	en_US
dc.type	Thesis	en_US
dc.contributor.department	電子物理系所	zh_TW
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