鍍膜氧壓對多鐵材料銩錳氧薄膜磁性的影響

Abstract

本實驗使用脈衝雷射濺鍍系統在不同鍍膜氧壓下成長正交結構銩錳氧薄膜於LAO(110)基板上。我們使用超導量子干涉儀量測不同鍍膜氧壓下薄膜磁化率與溫度關係時觀察到其磁性有一些變化，並將量測結果與薄膜XRD圖譜(020)繞射峰半高寬比較，認為在本實驗的樣品中，氧壓在0.05 torr下所成長的薄膜其磁結構較其它樣品較佳。

We have deposited a series of orthorhombic TmMnO3 thin films on LaAlO3(LAO)(110) substrates by pulsed laser deposition (PLD) under different oxygen pressures. These samples presumably will allow us to study how the magnetic properties of this multiferroic material vary with any structural variance induced by oxygen. In addition, it is also expected to give important implications in terms of considering device application. Our results show that the films deposited at PO2=0.05 torr appeared to display better crystalline quality and well-defined magnetic structure transition.