DEVELOPMENT OF TEMPERATURE-STABLE THICK-FILM DIELECTRICS .1. LOW-K DIELECTRIC

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DC 欄位	值	語言
dc.contributor.author	CHIOU, BS	en_US
dc.date.accessioned	2014-12-08T15:05:43Z	-
dc.date.available	2014-12-08T15:05:43Z	-
dc.date.issued	1989-12-01	en_US
dc.identifier.issn	0148-6411	en_US
dc.identifier.uri	http://dx.doi.org/10.1109/33.49048	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4256	-
dc.language.iso	en_US	en_US
dc.title	DEVELOPMENT OF TEMPERATURE-STABLE THICK-FILM DIELECTRICS .1. LOW-K DIELECTRIC	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1109/33.49048	en_US
dc.identifier.journal	IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY	en_US
dc.citation.volume	12	en_US
dc.citation.issue	4	en_US
dc.citation.spage	789	en_US
dc.citation.epage	797	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	電控工程研究所	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Institute of Electrical and Control Engineering	en_US
dc.identifier.wosnumber	WOS:A1989CK70700054	-
dc.citation.woscount	4	-
顯示於類別：	期刊論文

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