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dc.contributor.authorWang, Shing-Chungen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorKao, Chih-Chiangen_US
dc.contributor.authorChu, Jong-Tangen_US
dc.contributor.authorHuang, Gen-Shengen_US
dc.contributor.authorKuo, Hao-Chunaen_US
dc.contributor.authorChen, Shih-Weien_US
dc.contributor.authorKao, Tsung-Tingen_US
dc.contributor.authorChen, Jun-Rongen_US
dc.contributor.authorLin, Li-Fanen_US
dc.date.accessioned2014-12-08T15:05:45Z-
dc.date.available2014-12-08T15:05:45Z-
dc.date.issued2007-08-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.46.5397en_US
dc.identifier.urihttp://hdl.handle.net/11536/4285-
dc.description.abstractWe review the fabrication technology and performance characteristics of optically pumped GaN-based vertical cavity surface emitting lasers (VCSELs). Two types of VCSELs with different microcavity structures are described. First type of VCSEL has a hybrid microcavity structure that consists of an epitaxially grown AIN/GaN distributed Bragg reflector (DBR), a GaN active layer with InGaN/GaN multiple quantum wells (MQWs), and a Ta2O5/SiO2 dielectric DBR. Second type of VCSEL has a dielectric DBR microcavity structure that has a similar InGaN/GaN MQWs active layer sandwiched in two dielectric DBRs formed bv Ta2O5/SiO and TiO2/SiO2. Both types of VCSELs achieved laser action under optical pumping at room temperature with emission wavelength of 448 and 414 nm for hybrid DBR VCSEL and dielectric DBR VCSEL, respectively. Both lasers showed narrow emission linewidth with high degree of polarization and large spontaneous emission coupling factors of about 10-2. In addition, a high characteristic temperature of over 240K was measured, and a distinct spatially inhomooeneous emission pattern was observed.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjectvertical cavity surface emitting laseren_US
dc.subjectDBRen_US
dc.subjectlaser lift-offen_US
dc.titleOptically pumped GaN-based vertical cavity surface emitting lasers: Technology and characteristicsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1143/JJAP.46.5397en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume46en_US
dc.citation.issue8Ben_US
dc.citation.spage5397en_US
dc.citation.epage5407en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000249219200003-
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