| 標題: | POLY(FORMYLOXYSTYRENE) AS LIFT-OFF RESIST |
| 作者: | LOONG, WA HONG, WM 應用化學系 Department of Applied Chemistry |
| 公開日期: | 9-Apr-1989 |
| URI: | http://hdl.handle.net/11536/4380 |
| ISSN: | 0065-7727 |
| 期刊: | ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY |
| Volume: | 197 |
| Issue: | |
| 起始頁: | 83 |
| 結束頁: | PMSE |
| Appears in Collections: | Articles |
- ENHANCED OXYGEN REACTIVE ION ETCHING RESISTANCE OF DIAZONAPHTHOQUINONE-POLY (FORMYLOXYSTYRENE) RESIST SYSTEM BY PHOTOACID CATALYZED PHOTO-FRIES REARRANGEMENT AND POTASSIUM-ION TREATMENT IN AQUEOUS-SOLUTION / LOONG, WA;SU, AN
- PROCESSES OF TOP-IMAGED SINGLE-LAYER RESISTS BY POTASSIUM-ION TREATMENT IN SOLUTION / LOONG, WA;SU, AN;WANG, JL;CHU, CY
- PHOTOACID CATALYZED PHOTO-FRIES REARRANGEMENTS OF POLY(PARA-FORMYLOXYSTYRENE) AND FORMYLOXYNOVOLAC / LOONG, WA;CHEN, RH
- New nanometer T-gate fabricated by thermally reflowed resist technique / Lee, HM;Chang, EY;Chen, SH;Chang, CY
- 氮化鎵發光二極體P型金屬歐姆接觸特性及雷射剝離技術之研究 / 鄭好鈞;Hao-Chun Cheng;王興宗;S.C.Wang
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