A CONTROLLED RADIATION SOURCE AND ELECTRON X-RAY FLUX RATIOS IN AN ELECTRON-BEAM METAL EVAPORATOR

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	BHATTACHARYA, PK	en_US
dc.contributor.author	REISMAN, A	en_US
dc.contributor.author	CHEN, MC	en_US
dc.date.accessioned	2014-12-08T15:05:58Z	-
dc.date.available	2014-12-08T15:05:58Z	-
dc.date.issued	1988-07-01	en_US
dc.identifier.issn	0361-5235	en_US
dc.identifier.uri	http://dx.doi.org/10.1007/BF02652106	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4510	-
dc.language.iso	en_US	en_US
dc.title	A CONTROLLED RADIATION SOURCE AND ELECTRON X-RAY FLUX RATIOS IN AN ELECTRON-BEAM METAL EVAPORATOR	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1007/BF02652106	en_US
dc.identifier.journal	JOURNAL OF ELECTRONIC MATERIALS	en_US
dc.citation.volume	17	en_US
dc.citation.issue	4	en_US
dc.citation.spage	273	en_US
dc.citation.epage	283	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.identifier.wosnumber	WOS:A1988P335800002	-
dc.citation.woscount	28	-
顯示於類別：	期刊論文