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dc.contributor.authorHuang, G. S.en_US
dc.contributor.authorChen, Hou-Guangen_US
dc.contributor.authorChen, J.-R.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorWang, S. C.en_US
dc.date.accessioned2014-12-08T15:06:00Z-
dc.date.available2014-12-08T15:06:00Z-
dc.date.issued2007-06-01en_US
dc.identifier.issn0031-8965en_US
dc.identifier.urihttp://dx.doi.org/10.1002/pssa.200674711en_US
dc.identifier.urihttp://hdl.handle.net/11536/4552-
dc.description.abstractWe report the growth over 2 inch sapphire substrates of hybrid nitride-based microcavities using one crack-free highly reflective AIN/GaN distributed Bragg reflectors (DBRs) incorporated with AIN/GaN superlattice (SL) insertion layers and Ta2O5/SiO2 DBRs. The optical cavity is formed by a 5 lambda cavity consisting of n-type GaN, 10 pairs multiple quantum wells and p-type GaN sandwiched by AIN/GaN and Ta2O5/SiO2 DBRs. Reflectivity and photoluminescence measurements were carried out on these structures. A 29 periods AIN/GaN DBR incorporated with six AN/GaN superlattice insertion layers showed no observable cracks and achieved a peak reflectivity of 99.4% and a stopband of 21 run. Based on these high quality DBRs, the cavity mode is clearly resolved with a linewidth of 2.6 nm. These results demonstrate that the AIN/GaN system is very promising for the achievement of strong light-matter interaction and the fabrication of nitride-based vertical cavity surface emitting lasers. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.en_US
dc.language.isoen_USen_US
dc.titleHybrid nitride microcavity using crack-free highly reflective AlN/GaN and Ta2O5/SiO2 distributed Bragg mirrorsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1002/pssa.200674711en_US
dc.identifier.journalPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCEen_US
dc.citation.volume204en_US
dc.citation.issue6en_US
dc.citation.spage1977en_US
dc.citation.epage1981en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000247542500059-
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