完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lai, Fu-Der | en_US |
dc.contributor.author | Huang, C. Y. | en_US |
dc.contributor.author | Ko, Fu-Hsiang | en_US |
dc.date.accessioned | 2014-12-08T15:06:08Z | - |
dc.date.available | 2014-12-08T15:06:08Z | - |
dc.date.issued | 2007-05-01 | en_US |
dc.identifier.issn | 0167-9317 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.mee.2007.01.214 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/4697 | - |
dc.description.abstract | Amorphous (Al2O3)(x)-(TiO2)(1-x) composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al2O3)(x)-(TiO2)(1-x) composite films are linearly dependent on the Al2O3 mole fraction in the Al2O3-TiO2 composite film. The optical constants of these Al2O3-TiO2 Composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al2O3 mole fraction. The Al2O3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One Tu-phase-shifted Al2O3-TiO2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements. (c) 2007 Elsevier B.V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | composite film | en_US |
dc.subject | high transmittance attenuated phase shift mask | en_US |
dc.subject | ArF immersion lithography | en_US |
dc.subject | optical property | en_US |
dc.title | The optical properties of monolayer amorphous Al2O3-TiO2 composite films used as HT-APSM blanks for ArF immersion lithography | en_US |
dc.type | Article; Proceedings Paper | en_US |
dc.identifier.doi | 10.1016/j.mee.2007.01.214 | en_US |
dc.identifier.journal | MICROELECTRONIC ENGINEERING | en_US |
dc.citation.volume | 84 | en_US |
dc.citation.issue | 5-8 | en_US |
dc.citation.spage | 716 | en_US |
dc.citation.epage | 720 | en_US |
dc.contributor.department | 材料科學與工程學系奈米科技碩博班 | zh_TW |
dc.contributor.department | Graduate Program of Nanotechnology , Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000247182500007 | - |
顯示於類別: | 會議論文 |