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dc.contributor.authorJong, FCen_US
dc.contributor.authorHuang, TYen_US
dc.contributor.authorChao, TSen_US
dc.contributor.authorLin, HCen_US
dc.contributor.authorLeu, LYen_US
dc.contributor.authorYoung, Ken_US
dc.contributor.authorLin, CHen_US
dc.contributor.authorChiu, KYen_US
dc.date.accessioned2014-12-08T15:01:42Z-
dc.date.available2014-12-08T15:01:42Z-
dc.date.issued1997-07-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/55.596931en_US
dc.identifier.urihttp://hdl.handle.net/11536/484-
dc.description.abstractIn this letter, we report the effects of N2O annealing of interpoly oxide on flash cell performance. It is demonstrated that by adding an N2O anneal after interpoly oxide formation, improved cycling endurance is achieved, The program and erase efficiencies are also improved significantly, compared to the control cell without N2O anneal. The cells with N2O anneal show higher cell current (i.e., drain current), which can be ascribed to a lower threshold voltage and higher transconductance, compared to the control cell.en_US
dc.language.isoen_USen_US
dc.titleImproved flash cell performance by N2O annealing of interpoly oxideen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/55.596931en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume18en_US
dc.citation.issue7en_US
dc.citation.spage343en_US
dc.citation.epage345en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1997XG99700012-
dc.citation.woscount9-
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