OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS

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DC Field	Value	Language
dc.contributor.author	WU, CY	en_US
dc.contributor.author	KING, CW	en_US
dc.contributor.author	LEE, MK	en_US
dc.contributor.author	CHEN, CT	en_US
dc.contributor.author	SHIH, CT	en_US
dc.date.accessioned	2014-12-08T15:06:23Z	-
dc.date.available	2014-12-08T15:06:23Z	-
dc.date.issued	1983	en_US
dc.identifier.issn	0013-4651	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4944	-
dc.language.iso	en_US	en_US
dc.title	OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS	en_US
dc.type	Article	en_US
dc.identifier.journal	JOURNAL OF THE ELECTROCHEMICAL SOCIETY	en_US
dc.citation.volume	130	en_US
dc.citation.issue	2	en_US
dc.citation.spage	458	en_US
dc.citation.epage	462	en_US
dc.contributor.department	電控工程研究所	zh_TW
dc.contributor.department	Institute of Electrical and Control Engineering	en_US
dc.identifier.wosnumber	WOS:A1983QB20100041	-
dc.citation.woscount	5	-
Appears in Collections:	Articles

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