標題: 成長後退火對有機薄膜電晶體之電性影響探討
Post-Annealing Effect on the Performance of Organic Thin-Film Transistors
作者: 趙守敬
Chao, Shio-Jing
陳方中

田仲豪
Chen, Fang-Chung

Tien, Chung-Hao
光電工程學系
關鍵字: 成長後退火;載子遷移率;Post-annealing;mobility
公開日期: 2012
摘要: 本研究利用四駢環類的材料為有機主動層材料、聚乙烯醇肉桂酸酯為有機介電層材料,以金為電極製做出頂電極結構之有機薄膜電晶體,我們發現經由成長後退火處理可以提高元件之載子遷移率表現,進而去研究載子遷移率上升的原因,我們發現成長後退火會改變主動層的結晶型態、表面形態以及降低了利用轉換線法所萃取之接觸電阻。本實驗最佳化條件其電流關關比可至3.8x103,載子遷移率可達0.092 cm2/Vs。
In this study, we fabricated top contact organic thin film transistors with poly(2,5-bis(thiophene-2-yl)-(3,7-ditri-decanyltetrathienoacene) as active layer. The dielectric layer and source/drain electrodes were fabricated with poly(vinyl cinnamate)(PVCN) and Au, respectively. We found that the device performance were improved apparently after post-annealing. We realized that post-annealing could change the polymer morphology and improve the crystallization of the active layer. The contact resistances, which were extracted following the transfer-line method, were reduced after post-annealing. The optimized device exhibited a mobility of 0.092 cm2/Vs and an on-off ratio of 3.8x103.
URI: http://140.113.39.130/cdrfb3/record/nctu/#GT079924523
http://hdl.handle.net/11536/49804
顯示於類別:畢業論文