标题: | SI OXIDATION IN O2-N2 IN THE PRESENCE OF HCL |
作者: | LEE, MK LIU, SD LEE, CL 奈米中心 Nano Facility Center |
公开日期: | 1981 |
URI: | http://hdl.handle.net/11536/5031 |
ISSN: | 0013-4651 |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 128 |
Issue: | 3 |
起始页: | C103 |
结束页: | C103 |
显示于类别: | Articles |