标题: SI OXIDATION IN O2-N2 IN THE PRESENCE OF HCL
作者: LEE, MK
LIU, SD
LEE, CL
奈米中心
Nano Facility Center
公开日期: 1981
URI: http://hdl.handle.net/11536/5031
ISSN: 0013-4651
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 128
Issue: 3
起始页: C103
结束页: C103
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