SI OXIDATION IN O2-N2 IN THE PRESENCE OF HCL

Title:	SI OXIDATION IN O2-N2 IN THE PRESENCE OF HCL
Authors:	LEE, MK LIU, SD LEE, CL 奈米中心 Nano Facility Center
Issue Date:	1981
URI:	http://hdl.handle.net/11536/5031
ISSN:	0013-4651
Journal:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume:	128
Issue:	3
Begin Page:	C103
End Page:	C103
Appears in Collections:	Articles