完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | WU, CY | en_US |
dc.date.accessioned | 2014-12-08T15:06:28Z | - |
dc.date.available | 2014-12-08T15:06:28Z | - |
dc.date.issued | 1980 | en_US |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/5041 | - |
dc.identifier.uri | http://dx.doi.org/10.1063/1.328365 | en_US |
dc.language.iso | en_US | en_US |
dc.title | BARRIER HEIGHT REDUCTION OF THE SCHOTTKY-BARRIER DIODE USING A THIN HIGHLY DOPED SURFACE-LAYER | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.328365 | en_US |
dc.identifier.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 51 | en_US |
dc.citation.issue | 9 | en_US |
dc.citation.spage | 4919 | en_US |
dc.citation.epage | 4922 | en_US |
dc.contributor.department | 電控工程研究所 | zh_TW |
dc.contributor.department | 奈米中心 | zh_TW |
dc.contributor.department | Institute of Electrical and Control Engineering | en_US |
dc.contributor.department | Nano Facility Center | en_US |
dc.identifier.wosnumber | WOS:A1980KH98600058 | - |
dc.citation.woscount | 18 | - |
顯示於類別: | 期刊論文 |