REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	GUO, SF	en_US
dc.contributor.author	CHU, TY	en_US
dc.date.accessioned	2014-12-08T15:06:30Z	-
dc.date.available	2014-12-08T15:06:30Z	-
dc.date.issued	1980	en_US
dc.identifier.issn	0013-4651	en_US
dc.identifier.uri	http://hdl.handle.net/11536/5076	-
dc.language.iso	en_US	en_US
dc.title	REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS	en_US
dc.type	Meeting Abstract	en_US
dc.identifier.journal	JOURNAL OF THE ELECTROCHEMICAL SOCIETY	en_US
dc.citation.volume	127	en_US
dc.citation.issue	3	en_US
dc.citation.spage	C93	en_US
dc.citation.epage	C93	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.identifier.wosnumber	WOS:A1980JJ15600194	-
dc.citation.woscount	0	-
顯示於類別：	期刊論文