CF4 PLASMA-ETCHING ON LINBO3

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	LEE, CL	en_US
dc.contributor.author	LU, CL	en_US
dc.date.accessioned	2014-12-08T15:06:31Z	-
dc.date.available	2014-12-08T15:06:31Z	-
dc.date.issued	1979	en_US
dc.identifier.issn	0003-6951	en_US
dc.identifier.uri	http://hdl.handle.net/11536/5088	-
dc.identifier.uri	http://dx.doi.org/10.1063/1.90959	en_US
dc.language.iso	en_US	en_US
dc.title	CF4 PLASMA-ETCHING ON LINBO3	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1063/1.90959	en_US
dc.identifier.journal	APPLIED PHYSICS LETTERS	en_US
dc.citation.volume	35	en_US
dc.citation.issue	10	en_US
dc.citation.spage	756	en_US
dc.citation.epage	758	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	電控工程研究所	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Institute of Electrical and Control Engineering	en_US
dc.identifier.wosnumber	WOS:A1979HV84900013	-
dc.citation.woscount	29	-
顯示於類別：	期刊論文