完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lin, Meng-Han | en_US |
dc.contributor.author | Wu, Ming-Chi | en_US |
dc.contributor.author | Huang, Chun-Yang | en_US |
dc.contributor.author | Lin, Chen-Hsi | en_US |
dc.contributor.author | Tseng, Tseung-Yuen | en_US |
dc.date.accessioned | 2014-12-08T15:06:33Z | - |
dc.date.available | 2014-12-08T15:06:33Z | - |
dc.date.issued | 2010-07-28 | en_US |
dc.identifier.issn | 0022-3727 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1088/0022-3727/43/29/295404 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/5127 | - |
dc.description.abstract | The fabrication of SrZrO(3) (SZO) memory devices with oxygen-rich (OR) and oxygen-deficient (OD) double layers, their resistive switching (RS) characteristics and mechanisms are investigated in this study. Due to the difference in oxygen content between the OR and OD layers formed by an oxygen flow control (OFC) process during SZO deposition, the RS region is effectively reduced and localized within the OR layer, which leads to a low operation voltage and stable RS behaviours. Furthermore, the OFC SZO device exhibits high-speed switching (10 ns) over 400 times and long retention (>10(6) s), showing promising potential for next-generation nonvolatile memory applications. | en_US |
dc.language.iso | en_US | en_US |
dc.title | High-speed and localized resistive switching characteristics of double-layer SrZrO(3) memory devices | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1088/0022-3727/43/29/295404 | en_US |
dc.identifier.journal | JOURNAL OF PHYSICS D-APPLIED PHYSICS | en_US |
dc.citation.volume | 43 | en_US |
dc.citation.issue | 29 | en_US |
dc.citation.spage | en_US | |
dc.citation.epage | en_US | |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
顯示於類別: | 期刊論文 |