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dc.contributor.authorChang, Yung-Huangen_US
dc.contributor.authorLiu, Chien-Minen_US
dc.contributor.authorTseng, Yuan-Chiehen_US
dc.contributor.authorChen, Chihen_US
dc.contributor.authorChen, Chia-Chuanen_US
dc.contributor.authorCheng, Hsyi-Enen_US
dc.date.accessioned2014-12-08T15:06:43Z-
dc.date.available2014-12-08T15:06:43Z-
dc.date.issued2010-06-04en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/21/22/225602en_US
dc.identifier.urihttp://hdl.handle.net/11536/5277-
dc.description.abstractThis study investigated Schottky- and ohmic-contact effects upon the photoresponses of ITO/TiO(2)/Si and Ti/TiO(2)/Si nanotube-based photodiodes. The TiO(2) tube arrays were fabricated by atomic layer deposition (ALD) and shaped by an anodic aluminum oxide (AAO) template on a p-type Si substrate. The contact area between the electrode (Ti or ITO) and the TiO(2)'s tip was varied by tuning the tube's inner wall thickness with ALD, providing a direct and systematic probe of the heterojunction effects upon the photodiodes' responses. Results show that the Ti/TiO(2)/Si diode exhibits a highly thickness-dependent photoresponse. This is because the photocurrent is driven by the p-n junction at TiO(2)/Si alone and it faces no retarding at the ohmic contact of Ti/TiO(2). For the ITO/TiO(2)/Si diode, the Schottky contact at ITO/TiO(2) regulates photocurrent overriding TiO(2)/Si as a result of higher efficiency in photogeneration, leading to the opposite response compared with the Ti/TiO(2)/Si diode. Respective energy band diagrams are provided to support the statements above, and a consistent picture is obtained for both time response and quantum efficiency measurements.en_US
dc.language.isoen_USen_US
dc.titleDirect probe of heterojunction effects upon photoconductive properties of TiO(2) nanotubes fabricated by atomic layer depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0957-4484/21/22/225602en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume21en_US
dc.citation.issue22en_US
dc.citation.spageen_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
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