Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chang, Yung-Huang | en_US |
dc.contributor.author | Liu, Chien-Min | en_US |
dc.contributor.author | Tseng, Yuan-Chieh | en_US |
dc.contributor.author | Chen, Chih | en_US |
dc.contributor.author | Chen, Chia-Chuan | en_US |
dc.contributor.author | Cheng, Hsyi-En | en_US |
dc.date.accessioned | 2014-12-08T15:06:43Z | - |
dc.date.available | 2014-12-08T15:06:43Z | - |
dc.date.issued | 2010-06-04 | en_US |
dc.identifier.issn | 0957-4484 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1088/0957-4484/21/22/225602 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/5277 | - |
dc.description.abstract | This study investigated Schottky- and ohmic-contact effects upon the photoresponses of ITO/TiO(2)/Si and Ti/TiO(2)/Si nanotube-based photodiodes. The TiO(2) tube arrays were fabricated by atomic layer deposition (ALD) and shaped by an anodic aluminum oxide (AAO) template on a p-type Si substrate. The contact area between the electrode (Ti or ITO) and the TiO(2)'s tip was varied by tuning the tube's inner wall thickness with ALD, providing a direct and systematic probe of the heterojunction effects upon the photodiodes' responses. Results show that the Ti/TiO(2)/Si diode exhibits a highly thickness-dependent photoresponse. This is because the photocurrent is driven by the p-n junction at TiO(2)/Si alone and it faces no retarding at the ohmic contact of Ti/TiO(2). For the ITO/TiO(2)/Si diode, the Schottky contact at ITO/TiO(2) regulates photocurrent overriding TiO(2)/Si as a result of higher efficiency in photogeneration, leading to the opposite response compared with the Ti/TiO(2)/Si diode. Respective energy band diagrams are provided to support the statements above, and a consistent picture is obtained for both time response and quantum efficiency measurements. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Direct probe of heterojunction effects upon photoconductive properties of TiO(2) nanotubes fabricated by atomic layer deposition | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1088/0957-4484/21/22/225602 | en_US |
dc.identifier.journal | NANOTECHNOLOGY | en_US |
dc.citation.volume | 21 | en_US |
dc.citation.issue | 22 | en_US |
dc.citation.spage | en_US | |
dc.citation.epage | en_US | |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
Appears in Collections: | Articles |