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dc.contributor.authorChuang, Wei-Yien_US
dc.contributor.authorChao, Paul C. -P.en_US
dc.contributor.authorYoung, Kuu-Youngen_US
dc.date.accessioned2014-12-08T15:06:47Z-
dc.date.available2014-12-08T15:06:47Z-
dc.date.issued2010-06-01en_US
dc.identifier.issn0018-9464en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TMAG.2010.2046399en_US
dc.identifier.urihttp://hdl.handle.net/11536/5320-
dc.description.abstractThe proposed method is intended to adjust the electrode potentials used in deep brain stimulation (DBS) with the consideration of both tissue transform and thermal effects caused by stimulation. During a typical DBS process, it is essential, for an effective treatment, to control the stimulation strength and region with varied applied electrode potentials. Some previous studies have been devoted for numerical simulations to find suitable electrode voltage levels for pre-desired stimulated strength and region. These studies consider only one of the two complexity factors due to the intrusion of the DBS lead: 1) a layer of extracellular fluid and giant cell often formed around the DBS leads, called the peri-electrode space and 2) thermal effects. These two factors should both be considered in finite element electromagnetic analysis (FEA), which provides the means to adjust electrode potential for the originally-desired DBS region-called the volume of tissue activated (VTA). Simulation results show that there should be a limiting stimulation voltage to meet the temperature constraint.en_US
dc.language.isoen_USen_US
dc.subjectDeep brain stimulation (DBS)en_US
dc.subjectfinite element analysis (FEA)en_US
dc.subjectperi-electrode spaceen_US
dc.subjectthermal effecten_US
dc.subjectvolume of tissue activated (VTA)en_US
dc.titleAdjusting Electrode Potentials to Compensate Thermal/Tissue Effects in Deep Brain Stimulation via Finite Element Electromagnetic Analysisen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TMAG.2010.2046399en_US
dc.identifier.journalIEEE TRANSACTIONS ON MAGNETICSen_US
dc.citation.volume46en_US
dc.citation.issue6en_US
dc.citation.spage2397en_US
dc.citation.epage2400en_US
dc.contributor.department影像與生醫光電研究所zh_TW
dc.contributor.department電機工程學系zh_TW
dc.contributor.departmentInstitute of Imaging and Biomedical Photonicsen_US
dc.contributor.departmentDepartment of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000278037800291-
dc.citation.woscount0-
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