可同時量測光學晶體厚度及光軸之影像式偏極光測量方法

Abstract

我們提出一個影像式偏極光量測系統，可同時量厚度與光軸方向的二維分佈。此設計結合了影像式偏光儀和旋轉樣品的方法並且可以量測從1um到mm等級的膜厚。其平面的解析度可達100 um。我們成功的驗證其功能於一個厚度為1-mm的LiNbO3、厚度為4.9-um的液晶樣品和厚度為10-um的空間光調制器(SLM)。最後，液晶光軸的指向在Néel wall附近和Néel wall結合點缺陷下的排列也被觀測並討論。Néel wall在電場作用下的行為也被觀測並討論。

An imaging polarimetry and data acquisition procedures are designed for determining two-dimensional distributions of the thickness and optical axis of an optical uniaxial film. Our design combines an imaging polarimeter with rotation sample scheme and can be employed for monitoring film thickness from 1 um to mm with an in-plane spatial resolution better than 100 um. We successfully demonstrate the functionality with a 1-mm thick stoichiometric LiNbO3 wafer, 4.9-um thick liquid crystal device and 10-um thick spatial light modulator (SLM).The LC director’s orientation of Néel wall with and without a point defect have been observed and discussed.The behavior of a Néel wall under applied electric field have been observed and discussed.