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dc.contributor.authorTai, Ya-Hsiangen_US
dc.contributor.authorKuo, Yan-Fuen_US
dc.contributor.authorSun, Guo-Peien_US
dc.date.accessioned2014-12-08T15:06:57Z-
dc.date.available2014-12-08T15:06:57Z-
dc.date.issued2010-05-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2010.2044292en_US
dc.identifier.urihttp://hdl.handle.net/11536/5432-
dc.description.abstractIn this paper, the photosensitive effect of n-type low-temperature polycrystalline silicon (LTPS) thin-film transistors (TFTs) after dc stress is analyzed. It is found that the illumination behaviors for poly-Si TFTs are dependent on the defect types created by different stress conditions of hot-carrier and self-heating effects. For a given stress-induced device degradation, the anomalous illumination behaviors are observed, and these photo-induced leakage currents are not included in the present SPICE device model. Therefore, based on trap-assisted and Poole-Frenkel effect, an empirical defect-related photo leakage current model based on Unit Lux Current (ULC) is proposed to depict the photo-induced current after device degradation. Furthermore, the verified equation of ULC is analytically derived and has good agreement with the experimental data.en_US
dc.language.isoen_USen_US
dc.subjectDC stressen_US
dc.subjectleakage currenten_US
dc.subjectphotosensitivityen_US
dc.subjectpoly-Si thin-film transistor (TFT)en_US
dc.titleAn Empirical Defect-Related Photo Leakage Current Model for LTPS TFTs Based on the Unit Lux Currenten_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2010.2044292en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume57en_US
dc.citation.issue5en_US
dc.citation.spage1015en_US
dc.citation.epage1022en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000278066500008-
dc.citation.woscount1-
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