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dc.contributor.authorChang, Kow-Mingen_US
dc.contributor.authorChang, Chih-Tienen_US
dc.contributor.authorChao, Kuo-Yien_US
dc.contributor.authorLin, Chia-Hungen_US
dc.date.accessioned2014-12-08T15:07:01Z-
dc.date.available2014-12-08T15:07:01Z-
dc.date.issued2010-05-01en_US
dc.identifier.issn1424-8220en_US
dc.identifier.urihttp://dx.doi.org/10.3390/s100504643en_US
dc.identifier.urihttp://hdl.handle.net/11536/5485-
dc.description.abstractA novel compensation method for Zirconium dioxide gated Ion Sensitive Field Effect Transistors (ISFETs) to improve pH-dependent drift was demonstrated. Through the sequential measurements for both the n-channel and p-channel ISFETs, 75-100% pH-dependent drift could be successfully suppressed for the first seven hours. As a result, a nearly constant drift rate versus pH value was obtained, which increases the accuracy of pH measurements. Meanwhile, the drawback of the hyperbolic-like change with time of the common drift behavior for ISFETs was improved. A state-of-the-art integrated scheme adopting this method was also illustrated.en_US
dc.language.isoen_USen_US
dc.subjectdriften_US
dc.subjectISFETen_US
dc.subjectpH-dependenten_US
dc.subjectZrO(2)en_US
dc.titleA Novel pH-dependent Drift Improvement Method for Zirconium Dioxide Gated pH-Ion Sensitive Field Effect Transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.3390/s100504643en_US
dc.identifier.journalSENSORSen_US
dc.citation.volume10en_US
dc.citation.issue5en_US
dc.citation.spage4643en_US
dc.citation.epage4654en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000278105100023-
dc.citation.woscount6-
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