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dc.contributor.author韓良愷en_US
dc.contributor.authorHAN, LIANG-KAIen_US
dc.contributor.author張俊彥en_US
dc.contributor.authorZHANG, JUN-YANen_US
dc.date.accessioned2014-12-12T02:09:30Z-
dc.date.available2014-12-12T02:09:30Z-
dc.date.issued1991en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT802430065en_US
dc.identifier.urihttp://hdl.handle.net/11536/56100-
dc.language.isozh_TWen_US
dc.subject低溫超高真空化學zh_TW
dc.subject相沈積法zh_TW
dc.subject元件特性zh_TW
dc.title以低溫超高真空化學汽相沈積法所製元件特性zh_TW
dc.titleCharacterization of devices fabricated by low temperature UHV/CVDen_US
dc.typeThesisen_US
dc.contributor.department電子研究所zh_TW
Appears in Collections:Thesis