以低溫超高真空化學汽相沈積法所製元件特性

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	韓良愷	en_US
dc.contributor.author	HAN, LIANG-KAI	en_US
dc.contributor.author	張俊彥	en_US
dc.contributor.author	ZHANG, JUN-YAN	en_US
dc.date.accessioned	2014-12-12T02:09:30Z	-
dc.date.available	2014-12-12T02:09:30Z	-
dc.date.issued	1991	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT802430065	en_US
dc.identifier.uri	http://hdl.handle.net/11536/56100	-
dc.language.iso	zh_TW	en_US
dc.subject	低溫超高真空化學	zh_TW
dc.subject	相沈積法	zh_TW
dc.subject	元件特性	zh_TW
dc.title	以低溫超高真空化學汽相沈積法所製元件特性	zh_TW
dc.title	Characterization of devices fabricated by low temperature UHV/CVD	en_US
dc.type	Thesis	en_US
dc.contributor.department	電子研究所	zh_TW
顯示於類別：	畢業論文